Моделювання магнітного поля мрс вакуумної установки ВУП-5М

Abstract

The main objective of the article is modification of the laboratory vacuum plant in order to secure the stable work regime in high vacuum conditions. The article offers the analysis of various configurations of the magnetron sputtering systems executed by modeling the magnetic field distribution for each configuration using "ELCUT" and constructing graphs based on the obtained data. Obtained relationships between magnetic induction and the distance to the face of the magnet show the advantage of the modified device in aforementioned working conditions.