Реализация импульсного режима питания магнетронно-распылительной системы под управлением микроконтроллера

Abstract

Technology application of high-quality thin films and coatings on a variety of products is critical for electronics, optics and other branches of engineering. The main problem consists of the low deposition rate, low efficiency of industrial sputtering systems, chemical reaction of the sprayed material with the reaction gas. In most cases, these problems are related to the power source of sputtering systems. This work is aimed at improving the efficiency of power supplies magnetron-sputtering systems.